In situ fluorescence yield soft X-ray absorption spectroscopy of electrochemical nickel deposition processes with and without ethylene glycol†
Abstract
The electrochemical Ni deposition at a platinum electrode was investigated in a plating nickel bath in the presence and absence of ethylene glycol (EG) using fluorescence yield soft X-ray absorption spectroscopy (FY-XAS) in the Ni L2,3-edge and O K-edge regions under potential control. At ≤+0.35 V vs. the reversible hydrogen electrode (RHE), the electrochemical Ni deposition was detected by the Ni L2,3-edge FY-XAS in the presence of EG whereas almost no such event was observed in the absence of EG. A drastic decrease of FY-XAS intensities in the O K-edge region was also observed in the presence of EG at >+0.35 V vs. RHE, suggesting that the nano-/micro-structured Ni deposition initiated by the removal of water molecules occurs on the Pt electrode. The complex formation of Ni2+ with EG and the adsorption of EG on the Ni surface could play an important role in the Ni deposition. This study demonstrates that the in situ FY-XAS is a powerful and surface-sensitive technique to understand (electro)chemical reactions including polyol synthesis and electrocatalysis at solid–liquid interfaces.
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