Issue 9, 2020

Sub-monolayer Au9 cluster formation via pulsed nozzle cluster deposition

Abstract

Submonolayer coverages of chemically synthesised triphenylphosphine-protected Au9 clusters on mica and TiO2 substrates were achieved through the development of a Pulsed Nozzle Cluster Deposition (PNCD) technique under high vacuum conditions. This method offers the deposition of pre-prepared, solvated clusters directly onto substrates in a vacuum without the potential for contamination from the atmosphere. AFM and TEM were used to investigate the rate of gold cluster deposition as a function of cluster solution concentration and the number of pulses, with pulse number showing the most effective control of the final deposition conditions. TEM and XPS were used to determine that the clusters retained their unique properties through the deposition process. Methanol solvent deposited in the PNCD process has been shown to be removable through post-deposition treatments. A physical model describing the vapour behaviour and solvent evaporation in a vacuum is also developed and presented.

Graphical abstract: Sub-monolayer Au9 cluster formation via pulsed nozzle cluster deposition

Supplementary files

Article information

Article type
Paper
Submitted
04 May 2020
Accepted
17 Jul 2020
First published
20 Jul 2020
This article is Open Access
Creative Commons BY-NC license

Nanoscale Adv., 2020,2, 4051-4061

Sub-monolayer Au9 cluster formation via pulsed nozzle cluster deposition

J. Daughtry, G. G. Andersson, G. F. Metha, S. Tesana and T. Nakayama, Nanoscale Adv., 2020, 2, 4051 DOI: 10.1039/D0NA00566E

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