Issue 41, 2014

A facile way to introduce planar defects into colloidal photonic crystals for pronounced passbands

Abstract

We demonstrate a facile method for introducing planar defects into colloidal photonic crystals. Firstly, a 2D monolayer of SiO2 microspheres (guest spheres) was fabricated at the air/water interface by compressing the individual microspheres with a surfactant into long-range hexagonal arrays. The floating monolayer, which served as our defect layer, was then transferred onto a pre-deposited colloidal crystal slab consisting of PS@SiO2 microspheres (host spheres). Subsequently, a second colloidal crystal slab of host spheres was deposited on the surface of the defect layer. In comparison to previous methods to introduce planar defects into colloidal photonic crystals, this fabrication results in pronounced passbands in the band gaps of the colloidal photonic crystals. More importantly, the FWHM of the passband in our experiment is just 16 nm, which is narrower than the previously reported results to the best of our knowledge. Furthermore, the defect modes can be engineered by changing the diameter of the guest spheres and/or transforming the host spheres from PS@SiO2 spheres to hollow SiO2 spheres by calcination. The measured defect modes in the spectra match well with the simulated results.

Graphical abstract: A facile way to introduce planar defects into colloidal photonic crystals for pronounced passbands

Supplementary files

Article information

Article type
Paper
Submitted
04 May 2014
Accepted
30 Jun 2014
First published
04 Jul 2014

J. Mater. Chem. C, 2014,2, 8829-8836

A facile way to introduce planar defects into colloidal photonic crystals for pronounced passbands

K. Zhong, P. Demeyer, X. Zhou, O. Kruglova, N. Verellen, V. V. Moshchalkov, K. Song and K. Clays, J. Mater. Chem. C, 2014, 2, 8829 DOI: 10.1039/C4TC00912F

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements