Issue 16, 2011
From the journal:

CrystEngComm

Influence of active afterheater on the fluid dynamics and heat transfer during Czochralski growth of oxide single crystals

Mohammad Hossein Tavakoli,*a   Shirin Omida  and  Ebrahim Mohammadi-Maneshb  

* Corresponding authors

a Physics Department, Bu-Ali Sina University, Hamedan, I.R.Iran
E-mail: mht@basu.ac.ir, mhtvkl@gmail.com
Fax: +98 811 8280440
Tel: +98 811 8271541

b Physics Department, Malayer University, Malayer, I.R.Iran

Abstract

For an oxide Czochralski crystal growth system, the influence of an active afterheater on the characteristics of the growth process such as temperature and flow fields, crystal-melt interface and the structure of heat transfer have been studied numerically using the finite element method. Several types of heat transfer mechanism, which are convection and conduction within the melt, conduction and radiation within the grown crystal, gas convection and radiative heat exchange between the exposed surfaces, have been taken into account. A comparison between the obtained results demonstrates the role and importance of an active afterheater on the basic parameters of the growth process such as thermal environment and heat transfer structure in oxide Czochralski growth systems.

Graphical abstract: Influence of active afterheater on the fluid dynamics and heat transfer during Czochralski growth of oxide single crystals

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Article information

DOI
https://doi.org/10.1039/C1CE05056G
Article type
Paper
Submitted
14 Jan 2011
Accepted
12 May 2011
First published
15 Jun 2011

CrystEngComm, 2011,13, 5088-5093

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Influence of active afterheater on the fluid dynamics and heat transfer during Czochralski growth of oxide single crystals

M. H. Tavakoli, S. Omid and E. Mohammadi-Manesh, CrystEngComm, 2011, 13, 5088 DOI: 10.1039/C1CE05056G

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