Issue 5, 2004
From the journal:

Journal of Analytical Atomic Spectrometry

Rf-GDOES depth profiling analysis of a monolayer of thiourea adsorbed on copper

K. Shimizu,a   R. Payling,b   H. Habazaki,c   P. Skeldond  and  G. E. Thompsond  

a University Chemical Laboratory, Keio University, 4-1-1 Hiyoshi, Yokohama, Japan

b Department of Physics, University of Newcastle, NSW, Australia

c Graduate School of Engineering, Hokkaido University, N13-W8, Sapporo, Japan

d Corrosion and Protection Centre, University of Manchester Institute of Science and Technology, Manchester, UK

Abstract

The first example of depth profiling analysis, by rf-GDOES, of a layer of sub-nanometre thickness is presented. The example selected is that of a monolayer of thiourea adsorbed on a mirror-polished copper substrate. The adsorbed layer is disclosed clearly in the depth profile as narrow peaks, above the copper substrate, of carbon, hydrogen, nitrogen and sulfur. Further, the positions of peaks are separated and located in the order that is expected from the orientation of the thiourea molecules adsorbed on the copper substrate, namely the nitrogen peak was observed prior to the sulfur peak.

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Article information

DOI
https://doi.org/10.1039/B400918P
Article type
Paper
Submitted
19 Jan 2004
Accepted
17 Feb 2004
First published
01 Apr 2004

J. Anal. At. Spectrom., 2004,19, 692-695

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Rf-GDOES depth profiling analysis of a monolayer of thiourea adsorbed on copper

K. Shimizu, R. Payling, H. Habazaki, P. Skeldon and G. E. Thompson, J. Anal. At. Spectrom., 2004, 19, 692 DOI: 10.1039/B400918P

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