Issue 16, 2001
From the journal:

Physical Chemistry Chemical Physics

Complex formation between halogens and sulfoxides on metal surfaces

Siv K. Sia  and  Andrew A. Gewirth*a  

* Corresponding authors

a Department of Chemistry, and Frederick Seitz Materials Research Laboratory, Uniersity of Illinois at Urbana-Champaign, Urbana, IL, USA

Abstract

We report the results of in situ scanning tunneling microscope (STM), UV-vis spectroscopy, and differential capacitance measurements obtained from Au(111) and Ag(111) surfaces in neat solutions of dimethylsulfoxide (DMSO) or tetramethylenesulfoxide (TMSO) containing either KI or KBr. STM measurements initially reveal the formation of the expected I or Br adlattice, but later show the formation of an additional surface species, the growth of which is dependent on the exact nature of the surface, solvent, and anion. These results are interpreted in terms of formation of a 1:1 complex between the solvent and I2 or Br2.

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Article information

DOI
https://doi.org/10.1039/B101279G
Article type
Paper
Submitted
08 Feb 2001
Accepted
20 Apr 2001
First published
01 Jun 2001

Phys. Chem. Chem. Phys., 2001,3, 3325-3329

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Complex formation between halogens and sulfoxides on metal surfaces

S. K. Si and A. A. Gewirth, Phys. Chem. Chem. Phys., 2001, 3, 3325 DOI: 10.1039/B101279G

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