Issue 88, 2014
From the journal:

Chemical Communications

Substrate-induced effects in thin films of a potential magnet composed of metal-free organic radicals deposited on Si(111)†

A. Caneschia  and  M. B. Casu*b  

* Corresponding authors

a Department of Chemistry and RU INSTM, University of Florence, Via della Lastruccia 3, I-50019 Sesto Fiorentino, Italy

b Institute of Physical and Theoretical Chemistry, University of Tübingen, Auf der Morgenstelle 18, D-72076 Tübingen, Germany
E-mail: benedetta.casu@uni-tuebingen.de

Abstract

We deposit a paramagnetic pyrene derivative of the nitronyl nitroxide radical on Si(111). The molecules experience a strong chemical interaction with the substrate that influences the film growth. We also study the time evolution of the nitronyl nitroxide radical under a micro-focused soft X-ray beam, observing a stable radical as a product. This result hints at the possibility of using this class of materials in dosimeters and sensors.

Graphical abstract: Substrate-induced effects in thin films of a potential magnet composed of metal-free organic radicals deposited on Si(111)

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Article information

DOI
https://doi.org/10.1039/C4CC05990E
Article type
Communication
Submitted
31 Jul 2014
Accepted
08 Sep 2014
First published
09 Sep 2014
This article is Open Access
Creative Commons BY-NC license

Chem. Commun., 2014,50, 13510-13513

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Substrate-induced effects in thin films of a potential magnet composed of metal-free organic radicals deposited on Si(111)

A. Caneschi and M. B. Casu, Chem. Commun., 2014, 50, 13510 DOI: 10.1039/C4CC05990E

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