Issue 2, 2005

Quantum yields of OH, HO2 and NO3 in the UV photolysis of HO2NO2

Abstract

Quantum yields, Φ, of OH and HO2 in the ultraviolet photolysis of HO2NO2 (peroxynitric acid, PNA) at 193 and 248 nm and that of NO3 at 193, 248 and 308 nm are reported. Quantum yields were measured using pulsed excimer laser photolysis combined with pulsed laser induced fluorescence (PLIF) detection of OH radicals and cavity ring-down (CRD) detection of NO3 radicals. HO2 radicals were quantified by converting them to OH via the HO2 + NO → OH + NO2 reaction and detecting OH. The quantum yields obtained at 296 K are: Φ193 nm(OH) = 0.21 ± 0.12, Φ248 nm(OH) = 0.085 ± 0.08, Φ193 nm(HO2) = 0.56 ± 0.09, Φ248 nm(HO2) = 0.89 ± 0.26, Φ193 nm(NO3) = 0.35 ± 0.09, Φ248 nm(NO3) = 0.08 ± 0.04 and Φ308 nm(NO3) = 0.05 ± 0.02. The quoted uncertainties are 2σ (95% confidence level) and include estimated systematic errors. Our results are compared with the previous quantum yield measurements of OH (MacLeod et al., J. Geophys. Res., 1988, 93, 3813) and NO2 (Roehl et al., 2001, J. Phys. Chem., 105, 1592) at 248 nm and the discrepancies are discussed. The rate coefficients at 298 K for reactions of OH with HO2NO2, H2O2, HNO3 and NO are also reported.

Graphical abstract: Quantum yields of OH, HO2 and NO3 in the UV photolysis of HO2NO2

Article information

Article type
Paper
Submitted
01 Sep 2004
Accepted
13 Oct 2004
First published
07 Dec 2004

Phys. Chem. Chem. Phys., 2005,7, 342-348

Quantum yields of OH, HO2 and NO3 in the UV photolysis of HO2NO2

E. Jiménez, T. Gierczak, H. Stark, J. B. Burkholder and A. R. Ravishankara, Phys. Chem. Chem. Phys., 2005, 7, 342 DOI: 10.1039/B413429J

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