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Mechanism Study for Thermal/Electric Field Poling of Fused Silica

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Abstract

On the basis of the experimental reports, the mechanism of the second-order susceptibility χ(2) for the thermal/electric field poling of fused silica is analyzed, and expressions for χ(2) are detailedly derived and numerically calculated for the first time. By comparison the theoretical value of χ(2) with the experiment results, we propose that the effective χ(2) is created via both the interaction of the intense electric field with the third-order susceptibility χ(3) and the dipole orientation. The theoretical results show that, in the differently applied voltage, the dipole orientation and χ(3) play different role in the formation of χ(2). This theory successfully explains some experiment results.

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Authors and Affiliations

  1. Department of Electronic Engineering, Tsinghua University, Beijing, 100084, People's Republic of China

    X.-M Lui

  2. Department of Electronic Engineering, Southeast University, Nanjing, 210096, People's Republic of China

    M.-D Zhang

Authors
  1. X.-M Lui
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  2. M.-D Zhang
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Lui, XM., Zhang, MD. Mechanism Study for Thermal/Electric Field Poling of Fused Silica. International Journal of Infrared and Millimeter Waves 22, 1643–1651 (2001). https://doi.org/10.1023/A:1015056414886

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