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Application of Temperature Modulated Relative Dilatometry. Temperatures of adhesion degradation

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Abstract

Application of temperature modulated dilatometry (TM DIL) to investigation on degradation of the adhesion between ceramic films and the substrate is presented. Layers of titanium nitride deposited by plasma assisted physical vapour deposition (PA PVD) methods on the Armco iron substrates were tested. This paper shows that the TM DIL method is helpful in determining the usefulness of the titanium nitride covering of the cutting tools and machine parts.

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Authors and Affiliations

  1. Technical University of Koszalin, ul. Racławicka 15/17, 75-620, Koszalin, Poland

    P. Myśliński & A. Wąsik

  2. Research Institute for Solid State Physics and Optics, Hungarian Academy of Sciences, 1525, Budapest, P.O. Box 49, Hungary

    P. Kamasa

Authors
  1. P. Myśliński
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  2. P. Kamasa
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  3. A. Wąsik
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Myśliński, P., Kamasa, P. & Wąsik, A. Application of Temperature Modulated Relative Dilatometry. Temperatures of adhesion degradation. Journal of Thermal Analysis and Calorimetry 65, 553–559 (2001). https://doi.org/10.1023/A:1017901708751

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  • DOI: https://doi.org/10.1023/A:1017901708751

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