Quantum Chemical Investigation of Mechanisms of Silane Oxidation

Mary M. Mader* and Per-Ola Norrby*
Contribution from the Department of Chemistry, Grinnell College, Grinnell, Iowa 50112, and Department of Medicinal Chemistry, The Royal Danish School of Pharmacy, Universitetsparken 2, DK-2100 Copenhagen, Denmark
J. Am. Chem. Soc., 2001, 123 (9), pp 1970–1976
DOI: 10.1021/ja001400p
Publication Date (Web): February 10, 2001
Copyright © 2001 American Chemical Society
*

In papers with more than one author, the asterisk indicates the name of the author to whom inquiries about the paper should be addressed.

 Grinnell College.; Current Address:  Eli Lilly and Company, Lilly Corporate Center, Drop Code 1523, Indianapolis, IN 46285. E-mail:  mader_mary@lilly.com.

 Royal Danish School of Pharmacy. Current address:  Technical University of Denmark, Department of Organic Chemistry, Building 201, Kemitorvet, DK-2800 Lyngby, Denmark. E-mail:  okpon@pop.dtu.dk.

Abstract

Several mechanisms for the peroxide oxidation of organosilanes to alcohols are compared by quantum chemical calculations, including solvation with the PCM method. Without doubt, the reaction proceeds via anionic, pentacoordinate silicate species, but a profound difference is found between in vacuo and solvated reaction profiles, as expected. In the solvents investigated (CH2Cl2 and MeOH), the most favorable mechanism is addition of peroxide anion to a fluorosilane (starting material or formed in situ), followed by a concerted migration and dissociation of hydroxide anion. In the gas phase, and possibly in very nonpolar solvents, concerted addition−migration of H2O2 to a pentacoordinate fluorosilicate is also plausible.

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History

  • Published In Issue March 07, 2001
  • Received April 21, 2000
    Revised Manuscript Received December 13, 2000

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