Elsevier

Vacuum

Volume 135, January 2017, Pages 121-123
Vacuum

First-principles study on doping effect of B in NbSi2 with C40 structure

https://doi.org/10.1016/j.vacuum.2016.11.007Get rights and content

Highlights

  • Solution strengthening mechanism of B in NbSi2 is studied by first-principles.

  • B prefers to occupy to OI site in comparison with the TI site.

  • B element results in brittle-to-ductile transition for NbSi2.

  • B element weakens the shear deformation resistance for NbSi2.

Abstract

The influence of B element on structure and mechanical properties of NbSi2 is investigated by using the first-principles approach. To explore the solution strengthening mechanism of B element, the doped sites including the octahedral interstice site (OI) and tetrahedral interstice site (TI) are considered. It is found that B element prefers to occupy the OI site in comparison with the TI site. B element occupied OI site can slightly improve the volume deformation resistance for NbSi2. Importantly, B element leads to brittle-to-ductile transition. The reason is that the addition of B element can weaken the charge interaction between the Nb and Si atoms.

Section snippets

Acknowledgments

This work is supported by National Natural Science Foundation of China (Grant: No.51174171).

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    Citation Excerpt :

    For instance, the anomalous strengthening of NbSi2 with C40 structure may be partially attributed to the segregation of interstitial oxygen atoms as an impurity [33]. The interstitial B atom in octahedral interstice site can slightly improve the volume deformation resistance of NbSi2 and B can also lead to brittle-to-ductile transition [34,35]. Further detailed investigations are needed to clarify those effects.

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