The present study reports structural and optical parameters of wide band gap oxide thick film prepared by screen-printing followed by sintering route. Characterization of the samples was carried out with UV-spectroscopy, XRD, SEM, and Photoluminous study. The XRD and SEM studies reveal that the film deposited is polycrystalline, double phase, and porous with unsymmetrical grain distributions. Optical diffused reflection spectroscopy and Pl measurements give optical band gap of 2.87 eV and near band edge emission at 430 nm.
