ScienceDirect® Home Skip Main Navigation Links
You have guest access to ScienceDirect. Find out more.
 
Home
Browse
My Settings
Alerts
Help
 Quick Search
 Search tips (Opens new window)
    Clear all fields    
advertisementadvertisement
Micron
Volume 38, Issue 2, February 2007, Pages 158-164
Special issue on Super-resolution and other Novel Microscopies
 
Font Size: Decrease Font Size  Increase Font Size
 Abstract - selected
Article
Purchase PDF (707 K)

  E-mail Article   
  Add to my Quick Links   
Bookmark and share in 2collab (opens in new window)
Request permission to reuse this article
  Cited By in Scopus (0)
 
 
 
Related Articles in ScienceDirect
View More Related Articles
 
View Record in Scopus
 
doi:10.1016/j.micron.2006.07.011    How to Cite or Link Using DOI (Opens New Window)
Copyright © 2006 Elsevier Ltd All rights reserved.

Polarization phase in aberration compensation

D. RoychowdhuryCorresponding Author Contact Information, a, K. Bhattacharyaa and A.K. Chakrabortya

aDepartment of Applied Optics and Photonics, University of Calcutta, 92, A.P.C. Road, Kolkata 700 009, India

Available online 31 July 2006.

Purchase the full-text article



References and further reading may be available for this article. To view references and further reading you must purchase this article.

Abstract

A phase/amplitude mask on the aperture of an imaging system results in a pupil function that is multiplicative with the lens function, resulting in a morphological transformation of the imaging wavefront. It was shown that such amplitude and phase functions can be implemented using polarization masks, with the advantage that the phase and amplitude can be controlled in real time and in some cases, independently of each other. The phase and amplitude variation over the mask can be controlled either by changing the polarization of the mask or by changing the input beam parameters. Wavefront tailoring using polarization-masked apertures is therefore feasible and may be utilized for focal shift and partial aberration compensation.

For complete compensation of aberration, the phase distribution over the mask should be conjugate to that of the phase error of the aberrant wavefront, which necessitates the use of a continuously variable polarization mask. Since such a mask is difficult to implement, we have considered polarizing masks consisting of discrete polarized zones on the lens aperture, leading to polarization phase steps on the exit pupil of the imaging system. The simulation results presented in this paper show that effects of focal shift, partial compensation of primary spherical aberration and astigmatism can indeed be achieved by the proper use of polarization masked apertures.

Keywords: Polarization phase; Aberration; Compensation

Article Outline

1. Introduction
2. The proposed system
3. IPSF of a two-zone circularly symmetric polarization masked apertures in presence of defocus and first order spherical aberration
3.1. Mathematical formulation
3.2. Simulation results
4. IPSF of a quadrant masked aperture in presence of defocus and astigmatism
4.1. Mathematical formulation
4.2. Simulation results
5. Conclusion
References








Micron
Volume 38, Issue 2, February 2007, Pages 158-164
Special issue on Super-resolution and other Novel Microscopies
 
Home
Browse
My Settings
Alerts
Help
Elsevier.com (Opens new window)
About ScienceDirect  |  Contact Us  |  Information for Advertisers  |  Terms & Conditions  |  Privacy Policy
Copyright © 2008 Elsevier B.V. All rights reserved. ScienceDirect® is a registered trademark of Elsevier B.V.