Elsevier

Energy Procedia

Volume 92, August 2016, Pages 309-316
Energy Procedia

Influence of the Discharge Mode on the Optical and Passivation Properties of SiNx:H Deposited by PECVD at Atmospheric Pressure

https://doi.org/10.1016/j.egypro.2016.07.087Get rights and content
Under a Creative Commons license
open access

Abstract

The cost of industrial silicon solar cells could be greatly reduced by the implementation of PECVD at atmospheric pressure for the deposition of the silicon nitride (SiN) antireflective coating. For a successful development of this vacuum-free process tool, a deep understanding of the plasma discharge mode has to be undertaken. This work focuses on the control of a wide range of plasma excitation conditions in order to obtain homogeneous dielectric barrier discharges (DBD) at atmospheric pressure, and thus dense and uniform SiN layers. The influence of the discharge mode is then studied in order to optimize the optical and passivation properties of the SiN thin films, showing good antireflective properties as well as surface recombination velocities as low as 15 cm.s-1.

Keywords

silicon nitride
antireflective and passivation coating
atmospheric pressure discharges
dielectric barrier discharge (DBD)

Cited by (0)

Peer review by the scientific conference committee of SiliconPV 2016 under responsibility of PSE AG.