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doi:10.1016/j.cad.2006.08.006 
Copyright © 2006 Elsevier Ltd All rights reserved.
Solid-based CAPP for surface micromachined MEMS devices
Received 15 January 2006;
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Abstract
Process planning for a MEMS device is almost always conducted manually by the designer to date. As the structures of MEMS devices become more and more complicated, in order to release the designers from the hard and tedious work and speed up the development of MEMS products, such a situation should be changed. In this study, a solid based CAPP method for surface micromachined MEMS device is presented. With this method, a MEMS device is designed with a traditional CAD system, and its process planning is conducted automatically based on the solid model created. The process features with engineering semantics are extracted first. Then, the process layer model is constructed with each process layer of the model being coincident with the fabrication layer of surface micromachining. Finally, the masks are synthesized and the fabrication process is generated. Furthermore, to guarantee the manufacturability of the designed MEMS device, a systematic evaluation method is proposed. The proposed design and CAPP methods enable designers to concentrate on functional and shape design of MEMS devices.
Keywords: CAPP; Solid model; MEMS; CAD
Abbreviations: MEMS: Micro Electromechanical Systems; VLSI: Very Large Scale Integration; CAPP: Computer Aided Process Planning; MBF: Manufacturing Base Face; PF: Process Feature; MUMPs: Multi-User MEMS Processes; MD: Manufacturing Direction; SLEME: Single-Layer Etching Manufacturability Evaluation; MLEME: Multi-Layer etching Manufacturability Evaluation.
Article Outline
- 1. Introduction
- 2. Related work
- 3. Method overview
- 4. Process layer modeling
- 4.1. Initial manufacturability evaluation on the input solid model
- 4.2. Process feature recognition
- 4.3. Feature based process layer modeling
- 4.4. Process layer model adaptation for multi-layer etch
- 5. Manufacturability evaluation of process layer model
- 6. Mask synthesis based on process layer model
- 7. Verification of the synthesized masks
- 8. Implementation
- 9. Conclusion
- Acknowledgements
- References
