X-ray imaging microscopy at 25 keV with Fresnel zone plate optics
Introduction
Many types of optical elements have been proposed and developed for hard X-ray microscopy. Fresnel zone plates (FZPs), total reflection mirrors, multilayer mirrors, Bragg Fresnel lenses, and refractive lenses have been used as objectives of hard X-ray imaging microscopes. On the contrary, in the soft X-ray region, the highest spatial resolution has been achieved by the FZPs fabricated using electron-beam lithographic techniques. However, those FZPs cannot be applied to hard X-ray microscopy above 20 keV, because the required thickness and aspect ratio of the FZPs are beyond the fabrication capabilities.
Sputtered-sliced FZP (SS-FZP) proposed by Rudolph and Schmahl [1] is one of promising candidates for high-energy X-ray optics, because thick FZP with narrow zone width can be fabricated by the sputter-slice technique. Therefore, the SS-FZP is considered to be suitable for high-energy X-ray imaging element. In this paper, we introduce an imaging X-ray microscope with the SS-FZP as an objective at 25 keV. Results of performance test are also described.
Section snippets
Experimental setup and results
The schematic diagram of the 25 keV X-ray imaging microscope is shown in Fig. 1. The SS-FZP fabricated at Osaka National Research Institute [2] is employed as the objective. It consists of 50 layers of Cu and Al deposited on a gold core. Thickness of the FZP is about 36 μm and the outermost zone width is 0.25 μm. The characteristics of the FZP have been evaluated. The measured focal length is 508 mm, and the measured diffraction efficiency of the first-order is about 15% for 25 keV X-rays.
The
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