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Thin Solid Films
Volume 406, Issues 1-2, 1 March 2002, Pages 30-39
 
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doi:10.1016/S0040-6090(01)01784-9    How to Cite or Link Using DOI (Opens New Window)
Copyright © 2002 Elsevier Science B.V. All rights reserved.

Dielectric and ferroelectric response of sol–gel derived Pb0.85La0.15TiO3 ferroelectric thin films on different bottom electrodes

S. Bhaskara, S. B. Majumdera, P. S. Dobala, S. B. Krupanidhib and R. S. KatiyarCorresponding Author Contact Information, E-mail The Corresponding Author, a

a Department of Physics, University of Puerto Rico, San Juan, PR 00931-3343, USA b Materials Research Center, Indian Institute of Science, Bangalore 560-012, India

Received 8 December 2000; 
revised 4 December 2001; 
accepted 10 December 2001. 
Available online 20 January 2002.

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Abstract

Sol–gel derived Pb0.85La0.15TiO3 thin films were deposited on Pt, Pt/Si, RuO2/Pt/Si and RuO2/Si bottom electrodes. The structural and microstructural characteristics of the films were studied using X-ray diffraction and atomic force microscopy techniques. Dielectric, ferroelectric and leakage current characteristics were evaluated and depth profile Auger electron spectroscopy was used to obtain direct evidence for reactivity and compositional changes at the film/electrode interface and determine their effect on the ferroelectric and dielectric properties of films. Films deposited on Pt electrode showed a relatively higher dielectric constant of approximately 1300, while the films on RuO2 exhibited lower dielectric constant of only 470. Jt characteristics with leakage current of approximately 10−8 A/cm2 under low biasing field (10 kV/cm) was observed for the films under study. The steady state field dependent dc conductivity was examined by the measurement of JE characteristics. At very low fields (<30 kV/cm) films followed ohmic behavior and was fitted with a space-charge-limited conduction mechanism in the intermediate fields (30–60 kV/cm). The on-set voltage for the non-linearity was considered as VTFL using which, the trap concentration estimated for films on RuO2/Si electrode was 1.23×1017 cm−3. Observed current characteristics have been correlated with large interfacial resistance at the film–electrode boundary. In the case of RuO2 bottom electrodes, the dielectric and ferroelectric properties are correlated with the electrode characteristics and Si diffusion at the film–electrode interface.

Author Keywords: Sol–gel; Bottom electrodes; Auger electron spectroscopy; Ruthenium oxide; Ferroelectric properties; Ruthenium

Article Outline

1. Introduction
2. Experimental methods
2.1. Thin film preparation
2.2. Film characterization
3. Results and discussion
3.1. Structural and surface morphology characteristics
3.2. Auger electron spectroscopy (AES) depth profile
3.3. Electrical characterization
3.3.1. Dielectric properties
3.3.2. Ferroelectric properties
3.3.3. Leakage current behavior
4. Discussion
5. Conclusion
Acknowledgements
References










Thin Solid Films
Volume 406, Issues 1-2, 1 March 2002, Pages 30-39
 
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