Plasma at the Nanoscale

Plasma at the Nanoscale

Micro and Nano Technologies
2022, Pages 137-166
Plasma at the Nanoscale

Chapter 6 - Plasma-treatment applications for fabricating third-generation solar cells

https://doi.org/10.1016/B978-0-323-89930-7.00001-7Get rights and content

Abstract

Low-temperature plasma processing is an interesting method of enhancing the performance and stability of nanostructured surfaces and interfaces in thin-film solar cell devices, and—most importantly—it enables manufacturing under low-temperature ambient conditions. In the last decade, traditional low-pressure batch processing using ultrapure gases has considerably shifted toward continuous processing under atmospheric conditions. Continuously processing optoelectronic nanomaterials by sheet-to-sheet (S2S) and roll-to-roll (R2R) methods represents a manufacturing revolution leading to low-cost, large-area, light-weight, flexible printed devices. However, S2S and R2R manufacturing requires nanomaterials to be quickly processed at low temperatures. Low-temperature atmospheric-pressure plasma can provide sufficient reactive and energetic species to rapidly process thermally sensitive surfaces and interfaces in thin-film solar cells and enable alternative manufacturing methods to time-consuming high-temperature processing. This chapter discusses recent advancements in the low-temperature plasma processing of various nano surfaces and interfaces in third-generation thin-film solar cells, which will importantly impact energy harvesting.

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