Recent progress in making highly charged ion beams

https://doi.org/10.1016/0168-583X(95)00177-8Get rights and content

Abstract

In this paper a review of the basic creation processes of multicharged ions will be made through the description of the principles of ECRIS (electron cyclotron resonance ion source) and EBIS (electron beam ion source). A comparison between the beam characteristics of these sources will be made in order to show the main fields of application of these different devices for atomic physics interests. We shall especially describe the efforts made to control the different ways of producing a wide range of gaseous and metallic elements (by direct evaporation in ECRIS or by monocharged ion injection with EBIS). We shall especially show the latest developments in the production of very highly charged ions with ECRIS like the MSU super conducting source or ECR4 Ganil source (Ar16+ and Ar17+ in CW mode) or EBIS machines like the CRYSIS EBIS from Stockholm (fully stripped Ar or Xe43+ in pulsed regime). We shall also show how one could simplify the multicharged ion source technology by using ultra compact ECRIS entirely built with permanent magnets (NANOGAN from GANIL/Caen or BECRIS from HMI/Berlin).

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