Elsevier

Optics Communications

Volume 9, Issue 4, December 1973, Pages 412-416
Optics Communications

High resolution hologram interferometry by electronic phase measurement

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Abstract

The described dual frequency method interpolates the fringe pattern of any kind of hologram interfermetry down to better than 1100 of a fringe, independent of intensity variations. Experiments with double-exposure holography demonstrate a resolution of 6 × 10−4 fringes at any point of the object. Spatial derivatives of deformations can be measured accurately for mechanical strain analysis.

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