Section 10. Spectroscopy
The effects of tensile stress on the Raman spectrum of silica glass

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Abstract

Uniaxial tension applied to vitreous silica fibers causes their Raman bands at 440 cm−1, 800 cm−1, 1050 cm−1, and 1190 cm−1 to decrease in frequency. The minimal effect of tensile stress on the frequency of defect bands at 490 cm−1 and 605 cm−1 supports their assignment to small ring structures.

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  • Composition and cooling-rate dependence of plastic deformation, densification, and cracking in sodium borosilicate glasses during pyramidal indentation

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    Furukawa et al. [24] have shown that a decrease in Si–O–Si bond angle increases the frequency of stretching–bending vibrational modes in Si–O–Si bridges, and thus higher wave numbers correlate to a more dense structure. However, as has been demonstrated by Michalske et al. [57] and Tallant et al. [58] the main band is also sensitive to elastic strains, such as residual elastic strain which are expected after indentation. A more accurate density calculation can be given by the analysis of the defect line D1 or D2, because these are less sensitive to elastic strains [16,57], where D2 has the additional advantage of a smaller overlap with the main silicate band [6].

  • Confirmation of thin surface residual compressive stress in silica glass fiber by FTIR reflection spectroscopy

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    Some authors however, have found that applied stresses on the structure of silica glass fibers are proportional to FTIR reflection and Raman peak shifts. Michalske et al. performed Raman on silica glass fibers held under tensile stresses up to 10 GPa [6,7] and found a continuous shift of the 1050 cm− 1 band to lower wavenumber proportional to increasing the tensile stress. Similarly, Tomozawa et al. [8,9] and Hepburn [10] performed Fourier transform infrared (FTIR) reflection peak wavenumber measurements on silica glass optical fibers in an elastically bent configuration which allowed them access to both the tensile and compressive sides.

  • Strength increase of silica glass fibers by surface stress relaxation: A new mechanical strengthening method

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    A structural change observed in silica glass that has been associated with surface structural and stress relaxation is a change in the SiOSi bond angle. Both surface fictive temperature changes, and stress changes, are accompanied by a shift in the IR asymmetric structural vibration band, or the corresponding Raman band, which indicates SiOSi bond angle changes [31–35]. Consider the case of surface stress relaxation of silica glass at low temperatures in the presence of water vapor, where the majority of water species entering the glass remain as molecular water.

  • Raman investigation of the drawing effects on Ge-doped fibers

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This work performed at Sandia National Laboratories supported by the U.S. Dept. of Energy under Contract Number DE-AC04-76 - DP00789.

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