Abstract
A pulsed jet nanoelectrospray technique was applied to direct fabrication of silver micropatterns. The deposition of a commercial organic silver nano-ink was performed in a fully voltage-controlled fashion by voltage pulses ranging from 550 to 800 V with variable durations. By using 15 μm nozzles, patterns with 100-μm-sized features were locally freeformed on a silicon substrate with a spraying distance of 250 μm. An energy-dispersive X-ray spectrum confirmed metallic silver was developed in all the patterns after heat treatment at 220°C. The size and microstructural evolution of silver films was observed to strongly depend on the deposition volume and material flow over substrate surface. A good linear relationship between the deposition volume and pulse duration was exhibited over the applied voltage range in the cone-jet mode, demonstrating a drop-on-demand capability. By fitting, the deposition volume rate was estimated to be in the range of 0.38–0.59 pL/ms and was shown to increase with the applied voltage.
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Wang, K., Stark, J.P.W. Direct fabrication and morphology of metallic micropatterns by pulsed jet nanoelectrospraying of silver nano-ink. J Coat Technol Res 9, 317–322 (2012). https://doi.org/10.1007/s11998-011-9370-x
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DOI: https://doi.org/10.1007/s11998-011-9370-x