Abstract
Zirconia (8 mol% yttria) (YSZ) amorphous layers were deposited by spray pyrolysis on Si oxidized substrates and crystallized by rapid thermal treatment in a home-made halogen lamps furnace. Uniform films were obtained by depositing up to six layers, followed by the thermal treatment. X-ray analysis showed that the cubic phase is obtained during the initial stage of the annealing process. No significant differences with increasing annealing time nor interaction between the YSZ film and the substrate were observed. Ionic conduction in air, with activation energies comparable to those of bulk YSZ ceramics, was observed. The electrical characteristics of the films make them suitable for microelectronics applications.
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Beltrán, N.H., Balocchi, C., Errazu, X. et al. Rapid thermal annealing of zirconia films deposited by spray pyrolysis. J. Electron. Mater. 27, L9–L11 (1998). https://doi.org/10.1007/s11664-998-0196-y
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DOI: https://doi.org/10.1007/s11664-998-0196-y