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Heteroepitaxial silicon-carbide nitride films with different carbon sources on silicon substrates prepared by rapid-thermal chemical-vapor deposition

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Abstract

Cubic crystalline silicon-carbon nitride (Si1−x−yCxNy) films have been grown successfully using various carbon sources by rapid-thermal chemical-vapor deposition (RTCVD). The characteristics of the Si1−x−yCxNy films grown with SiH3CH3, C2H4, and C3H8 are examined and compared by x-ray photoelectron spectroscopy (XPS) spectra, scanning electron microscopy (SEM) images, and transmission electron microscopy (TEM) patterns. The XPS spectra show that the differences of chemical composition and chemical-bonding state are co-related to the C bonding type of the different carbon source. The SEM images and TEM analysis indicate that the better Si1−x−yCxNy film can be obtained using C3H8 gas as the carbon source. In addition, correlations between the growing stages to the microstructure of the cubic-crystalline Si1−x−yCxNy films have been illustrated in detail.

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References

  1. C.H. Hsieh, Y.S. Huang, K.K. Tiong, C.W. Fan, Y.F. Chen, L.C. Chen, J.J. Wu, and K.H. Chen, J. Appl. Phys. 87, 280 (2000).

    Article  CAS  Google Scholar 

  2. D.M. Bhusari, C.K. Chen, K.H. Chen, T.J. Chuang, L.C. Chen, and M.C. Lin, J. Mater. Res. 12, 322 (1997).

    CAS  Google Scholar 

  3. K.H. Chen, J.J. Wu, C.Y. Wen, L.C. Chen, C.W. Fan, P.F. Kuo, Y.F. Chen, and Y.S. Huang, Thin Solid Films 355–356, 205 (1999).

    Article  Google Scholar 

  4. X.C. Xiao, Y.W. Li, L.X. Song, X.F. Peng, and X.F. Hu, Appl. Surf. Sci. 156, 155 (2000).

    Article  CAS  Google Scholar 

  5. W.T. Hsieh, Y.K. Fang, K.H. Wu, W.J Lee, and C.W. Ho, IEEE Trans. Electron. Dev. 48, 801 (2001).

    Article  CAS  Google Scholar 

  6. K.H. Wu, Y.K. Fang, J.J. Ho, W.T. Hsieh, and T.J. Chen, IEEE Electron. Dev. Lett. 19, 294 (1998).

    Article  CAS  Google Scholar 

  7. K.H. Wu, Y.K. Fang, J.J. Ho, W.T. Hsieh, W.H. Chuang, and J.D. Hwang, IEEE Photonics Technol. Lett. 10, 1611 (1998).

    Article  Google Scholar 

  8. K.H. Wu, Y.K. Fang, J.J. Ho, and T.J. Chen, IEEE Electron. Lett. 33, 1824 (1997).

    Article  CAS  Google Scholar 

  9. J.D. Hwang, Y.K. Fang, K.H. Wu, and S.M. Chou, IEEE Electron. Dev. 44, 2029 (1997).

    Article  CAS  Google Scholar 

  10. J.J. Wu, C.T. Wu, Y.C. Liao, T.R. Lu, L.C. Chen, K.H. Chen, L.G. Hwa, C.T. Kuo, and K.J. Liang, Thin Solid Films 355–356, 417 (1999).

    Article  Google Scholar 

  11. B.R. Stoner, G.H.M. Ma, S.D. Wolter, and J.T. Glass, Phys. Rev. B 45, 11067 (1992).

    Article  CAS  Google Scholar 

  12. D. Marton, K.J. Boyd, A.H. Al-Bayati, S.S. Todorov, and J.W. Rabalais, Phys. Rev. Lett. 73, 118 (1994).

    Article  CAS  Google Scholar 

  13. F.J. Gomez, P. Prieto, E. Elizalde, and J. Piqueras, Appl. Phys. Lett. 69, 773 (1996).

    Article  CAS  Google Scholar 

  14. W.F.A. Besling, A. Goossens, B. Meester, and J. Schoonmam, J. Appl. Phys. 83, 544 (1998).

    Article  CAS  Google Scholar 

  15. Database maintained and distributed by the International Centre for Diffraction Data (ICDD), Netown Square, PA (1999).

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Authors and Affiliations

  1. VLSI Technology Laboratory, Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, 701, Tainan, Taiwan, Republic of China

    Shyh-Fann Ting, Yean-Kuen Fang, Wen-Tse Hsieh, Yong-Shiuan Tsair, Cheng-Nan Chang, Chun-Sheng Lin, Ming-Chun Hsieh & Hsin-Che Chiang

  2. Department of Electronics Engineering, Fortune Institute of Technology, 842, Chi-shan Town, Kaohsiung, Taiwan, Republic of China

    Jyh-Jier Ho

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  1. Shyh-Fann Ting
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  2. Yean-Kuen Fang
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  3. Wen-Tse Hsieh
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  4. Yong-Shiuan Tsair
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  5. Cheng-Nan Chang
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  6. Chun-Sheng Lin
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  7. Ming-Chun Hsieh
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  8. Hsin-Che Chiang
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  9. Jyh-Jier Ho
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Ting, SF., Fang, YK., Hsieh, WT. et al. Heteroepitaxial silicon-carbide nitride films with different carbon sources on silicon substrates prepared by rapid-thermal chemical-vapor deposition. J. Electron. Mater. 31, 1341–1346 (2002). https://doi.org/10.1007/s11664-002-0119-2

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  • DOI: https://doi.org/10.1007/s11664-002-0119-2

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