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Character and fabrication of Al/Al2O3/Al tunnel junctions for qubit application

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  • Electronics
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  • Published: 22 January 2012
  • Volume 57, pages 409–412, (2012)
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Chinese Science Bulletin
Character and fabrication of Al/Al2O3/Al tunnel junctions for qubit application
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  • DanDan Shen1,
  • Ran Zhu1,
  • WeiWei Xu1,
  • JunJie Chang1,
  • ZhengMing Ji1,
  • GuoZhu Sun1,
  • ChunHai Cao1 &
  • …
  • Jian Chen1 

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Abstract

The superconductive Josephson junction is the key device for superconducting quantum computation. We have fabricated Al/Al2O3/Al tunnel junctions using a double angle evaporation method based on a suspended shadow mask. The Al2O3 junction barrier has been formed by introducing pure oxygen into the chamber during the fabrication process. We have adjusted exposure conditions by changing either the oxygen pressure or the oxidizing time during the formation of tunnel barriers to control the critical current density J c and the junction specific resistance R c . Measurements of the leakage in Al/Al2O3/Al tunnel junctions show that the devices are suitable for qubit applications.

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Authors and Affiliations

  1. Research Institute of Superconductor Electronics, Nanjing University, Nanjing, 210093, China

    DanDan Shen, Ran Zhu, WeiWei Xu, JunJie Chang, ZhengMing Ji, GuoZhu Sun, ChunHai Cao & Jian Chen

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  1. DanDan Shen
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  2. Ran Zhu
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  3. WeiWei Xu
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  4. JunJie Chang
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  5. ZhengMing Ji
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  6. GuoZhu Sun
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Correspondence to WeiWei Xu.

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Cite this article

Shen, D., Zhu, R., Xu, W. et al. Character and fabrication of Al/Al2O3/Al tunnel junctions for qubit application. Chin. Sci. Bull. 57, 409–412 (2012). https://doi.org/10.1007/s11434-011-4821-4

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  • Received: 18 March 2011

  • Accepted: 20 September 2011

  • Published: 22 January 2012

  • Issue Date: February 2012

  • DOI: https://doi.org/10.1007/s11434-011-4821-4

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Keywords

  • Al/Al2O3/Al junctions
  • electron beam evaporation
  • superconducting qubit
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