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Substrate Depletion Analysis and Modeling of the High Temperature Oxidation of Binary Alloys

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Abstract

To predict concentration changes in binary alloy due to preferential oxidation during high temperature oxidation, a model based on the flux balance of the oxidized element at the moving oxide/alloy interface has been developed. These changes are driven by the alloy oxidation rate k c . The model is numerically solved considering different initial alloy concentration profiles and a possible diffusion enhancement effect close to the alloy surface. After validating the model by comparison with Wagner’s analytical solution for Ni30wt%–Pt alloy oxidised at 850 °C, we show that the effects of an initial alloy depletion due to the presence of a passive oxide layer are cancelled after very short oxidation times. We also show that a diffusion acceleration due to work-hardening in the vicinity of the alloy surface induces an inflexion point in the depletion profile.

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Authors and Affiliations

  1. Ecole des Mines de Saint-Etienne, Laboratoire Claude Goux, UMR CNRS 5146, Centre SMS, 158 cours Fauriel, 42023, Saint-Etienne, France

    Etienne Marrier, Patrick Ganster, Nicolas Moulin & Krzysztof Wolski

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  1. Etienne Marrier
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  2. Patrick Ganster
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  3. Nicolas Moulin
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  4. Krzysztof Wolski
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Correspondence to Etienne Marrier.

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Marrier, E., Ganster, P., Moulin, N. et al. Substrate Depletion Analysis and Modeling of the High Temperature Oxidation of Binary Alloys. Oxid Met 79, 81–91 (2013). https://doi.org/10.1007/s11085-012-9353-z

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  • DOI: https://doi.org/10.1007/s11085-012-9353-z

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