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Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques

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Abstract

In this study, thin cobalt films were electrodeposited directly onto n-Si (100) using two different electrodeposition techniques: galvanostatic and potentiostatic. The morphological difference between galvanostatic and potentiostatic deposits was observed by atomic force microscopy (AFM) and X-ray diffraction (XRD). Analysis of the deposits by an alternating gradient field magnetometer (AGFM) showed the influence of the electrodeposition process on the magnetic properties of the film.

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Authors and Affiliations

  1. Laboratory of Corrosion Research, Metallurgy Department, Universidade Federal do Rio Grande do Sul, Av. Bento Gonçalves 9500/Setor 4/Prédio 75/232, Porto Alegre, 91501-970, Rio Grande do Sul, Brazil

    Taíse Matte Manhabosco & Iduvirges L. Müller

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  1. Taíse Matte Manhabosco
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  2. Iduvirges L. Müller
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Correspondence to Taíse Matte Manhabosco.

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Manhabosco, T.M., Müller, I.L. Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques. J Mater Sci 44, 2931–2937 (2009). https://doi.org/10.1007/s10853-009-3388-9

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  • DOI: https://doi.org/10.1007/s10853-009-3388-9

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