Abstract
TiAlN films were deposited on Ni-based alloy by RF sputtering technique. Electrochemical impedance spectroscopy was employed as in situ technique to investigate the evolution of the TiAlN films on exposure in biological media. After immediate- to short-term exposure, the biological media was further evaluated with inductively coupled plasma-atomic emission spectrometer (ICP-AES) to measure the release of metal ions, such as nickel. The results of ICP-AES analysis showed that TiAlN coated on a Ni-based alloy effectively reduced metal ion release levels, as compared to the uncoated Ni-based alloy. The effect of the nitride films was also reflected in corrosion resistance and the corrosion rate. It was demonstrated that the TiAlN-coated Ni-based alloy revealed a higher corrosion resistance than uncoated substrates. Furthermore, the impedance of nitride films on a Ni-based alloy was larger than that of the metal’s charge transfer reaction at short-term immersion.
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Acknowledgements
This work is supported by Center for Nano-Science and Technology of the University System of Taiwan, Taiwan under Project No. 91B0502J4. Partial support from National Science Council under the contract No. NSC 93-2216-E-007-035 is also appreciated.
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Liu, K.T., Duh, J.G. Electrochemical impedance study of TiAlN film coating on a Ni-based alloy in 0.9% NaCl. J Mater Sci 43, 3589–3595 (2008). https://doi.org/10.1007/s10853-008-2567-4
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DOI: https://doi.org/10.1007/s10853-008-2567-4