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Electron beam lithographic techniques and electrochemical reactions for the micro- and nanostructuring of surfaces under extreme conditions

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Abstract

An overview of nanostructuring of surfaces using electron-beam lithographic approaches combined with electrochemical techniques is given. We report the compatibility of conventional electron-beam lithography as well as an alternative method (electron-beam-induced deposition) with electroplating of metals and electrochemical etching of the substrates. This paper describes how to exploit these electron beam-writing techniques for highly selective electrochemical reactions at various surfaces. The ability to use electron beam-induced nanomasking even under extreme conditions is highlighted for the fabrication of structures in the sub-100 nm range.

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  1. Dept. of Materials Science, Institute for Surface Science and Corrosion (LKO), Martensstr. 7, D. 91058, Erlangen, Germany

    T. Djenizian & P. Schmuki

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  1. T. Djenizian
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  2. P. Schmuki
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Djenizian, T., Schmuki, P. Electron beam lithographic techniques and electrochemical reactions for the micro- and nanostructuring of surfaces under extreme conditions. J Electroceram 16, 9–14 (2006). https://doi.org/10.1007/s10832-006-0902-1

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  • DOI: https://doi.org/10.1007/s10832-006-0902-1

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