Single-shot reflection Z-scan for measurements of the nonlinear refraction of nontransparent materials

Abstract

A single-shot technique for the measurements of the nonlinear optical refraction of the materials possessing limited transparency is presented. This method allows for analyzing the nonlinear refraction using the tilted samples placed from both sides of the focal plane of cylindrical lens. The proposed technique was examined in the cases of GaAs and Si at a wavelength of 790 nm. The nonlinear refractive indices of these materials were measured to be 3×10^-12 cm² W^-1 and 4×10^-13 cm² W^-1 (GaAs) and 5×10^-12 cm² W^-1 and 8×10^-13 cm² W^-1 (Si) by using the proposed technique and standard RZ-scans. The inconsistence between these fitting procedures of the two methods is discussed.