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A novel approach to microbial breeding—low-energy ion implantation

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Abstract

Low-energy ions exist widely in the natural world. People had neglected the interaction between low-energy ions and material; it was even more out of the question to study the relation of low-energy ions and the complicated organism until the biological effects of low-energy ion implantation were discovered in 1989. Nowadays, the value of low-energy ion beam implantation, as a new breeding way, has drawn extensive attention of biologists and breeding experts. In this review, the understanding and utilization of microbial breeding by low-energy ion beam irradiation is summarized, including the characteristics of an ion beam bioengineering facility, present status of the technology of low-energy ions for microbial breeding, and new insights into microbial biotechnology.

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Authors and Affiliations

  1. Henan University of Science and Technology, P.O. Box 471003, Luoyang, People’s Republic of China

    Shao-bin Gu, Shi-chang Li & Ying Wu

  2. Key Laboratory of Ion Beam Bioengineering, Chinese Academy of Sciences, P.O. Box 1126, Hefei, 230031, People’s Republic of China

    Hui-yun Feng & Zeng-liang Yu

Authors
  1. Shao-bin Gu
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  2. Shi-chang Li
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  3. Hui-yun Feng
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  4. Ying Wu
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  5. Zeng-liang Yu
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Correspondence to Shao-bin Gu.

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Gu, Sb., Li, Sc., Feng, Hy. et al. A novel approach to microbial breeding—low-energy ion implantation. Appl Microbiol Biotechnol 78, 201–209 (2008). https://doi.org/10.1007/s00253-007-1312-2

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  • DOI: https://doi.org/10.1007/s00253-007-1312-2

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