Abstract
Oxidative or reducing treatments at 873 K of Ga2O3/H-ZSM-5 (Si/Al = 13 or 60) cause a change in H+ concentration as evidenced by IR spectroscopy of OH groups at 3610 cm−1; this change is nicely correlated to the variation ofm-xylene isomerisation rate.
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Mériaudeau, P., Sapaly, G., Wicker, G. et al. Revisiting Ga2O3/H-ZSM-5 propane aromatization catalysts. Catal Lett 27, 143–148 (1994). https://doi.org/10.1007/BF00806987
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DOI: https://doi.org/10.1007/BF00806987