Abstract
The temperature dependence in the range 77–400 K of the carrier concentration, resistivity and mobility of a series of n and p-type single crystal, liquid-phase epitaxial layers of Ga1−xAlxAs are presented. These layers were doped, n-type with tellurium, and p-type with germanium to yield carrier concentrations in the range 1017 – 1018cm−3 at 295 K. Donor and acceptor ionization energies, εD and εA, are derived from the data. The dependence of εD on alloy composition is interpreted in terms of the known band structure variation in the alloy system.
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SpringThorpe, A.J., King, F.D. & Becke, A. Te and Ge — doping studies in Ga1−xAlxAs. J. Electron. Mater. 4, 101–118 (1975). https://doi.org/10.1007/BF02657839
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DOI: https://doi.org/10.1007/BF02657839