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Microhardness and internal stress of Si3N4-SiC films prepared by plasma CVD

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Technological University of Nagaoka, 949-54, Nagaoka, Japan

    Kiichiro Kamata & Naoyoshi Aizawa

  2. Nagano College of Technology, 380, Nagano, Japan

    Minoru Moriyama

Authors
  1. Kiichiro Kamata
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  2. Naoyoshi Aizawa
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  3. Minoru Moriyama
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Kamata, K., Aizawa, N. & Moriyama, M. Microhardness and internal stress of Si3N4-SiC films prepared by plasma CVD. J Mater Sci Lett 5, 1055–1057 (1986). https://doi.org/10.1007/BF01730281

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  • DOI: https://doi.org/10.1007/BF01730281

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