Abstract
The formation of molecule-like complexes, consisting of a defect and a radioactive111In atom, is studied using the perturbedγγ angular correlation technique (PAC). The complexes are characterized by their defect specific electric field gradients which also contain information on the geometry of the formed complexes. Whereas the complex is formed with the111In atom, its electric field gradient is measured after the decay of the radioactive111In atom to111Cd. Formation and dissolution of the molecule-like complexes is pursued for a variety of different conditions, such as sample temperature, dopant concentration and position of the Fermi level. In particular, the interaction of In atoms with the following defects in Si was investigated: Intrinsic defects, created by particle irradiation; substitutional donor atoms (P, As, Sb, Bi); and interstitial impurity atoms (Li, H, and an unidentified X defect); especially, the latter ones are known to passivate acceptor atoms in Si. Methodology and specific properties of the PAC technique will be illustrated with the help of these examples.
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H. de Waard, G.J. Kemerink: Proc. 12th Intl. Conf. Defects in Semiconductors, Physica116B, 210 (1983)
H.G. Devare, P.N. Tandon, S.H. Devare: Proc. 17th Intl. Conf. Hyperfine Interactions (Baltzer, Basel 1987) and Hyp. Int.34/35 (1987)
H.J. von Bardeleben: Proc. 14th Intl. Conf. Defects in Semiconductors (Trans Tech Publications, Switzerland 1986)
C. Abromeit, H. Wellenbergen: Proc. Intl. Conf. Vacancies and Interstitials in Metals and Alloys (Trans Tech Publications, Switzerland 1987)
F. Pleiter, C. Hohenemser: Phys. Rev. B25, 106 (1982)
E. Recknagel, G. Schatz, Th. Wiehert: Hyperfine Interactions of Radioactive Nuclei, ed. by J. Christiansen, Topics in Current Physics, Vol. 31 (Springer, Berlin, Heidelberg 1983) p. 133
J. Takamure, M. Doyama, M. Kiritani: Proc. Yamade 5th Conf. Point Defects and Defect Interactions in Metals (University of Tokyo Press 1982)
E.N. Kaufmann, R. Kalish, R.A. Naumann, S. Lis: J. Appl. Phys.48, 3332 (1977)
H.J. Leisi: Phys. Rev. A1, 1662 (1970)
Th. Wichert, E. Recknagel: Microscopic Methods in Metals, ed. by U. Gonser, Topics in Current Physics, Vol. 40 (Springer, Berlin, Heidelberg 1986) p. 317
H. Frauenfelder, R.M. Steffen: Alpha-, Beta-, Gamma-Ray Spectroscopy, ed. by K. Siegbahn (North-Holland, Amsterdam 1965) Vol. 2, p. 997
M. Deicher, R. Minde, E. Recknagel, Th. Wiehert: Hyp. Int.15/16, 437 (1983)
D. Wegner: Hyp. Int.23, 179 (1985)
J.P. Biersack, L.G. Haggmark: Nucl. Instr. Meth.174, 257 (1980)
C.S. Fuller, J.A. Ditzenberger: J. Appl. Phys.27, 544 (1956)
A. Seeger, K.P. Chik: Phys. Stat. Solidi29, 455 (1968)
M. Deicher, G. Grübel, E. Recknagel, Th. Wichert: Proc. 14th Intl. Conf. Defects in Semiconductors, ed. H.J. von Bardeleben (Trans Tech Publications, Switzerland 1986) p. 1141
M. Deicher, G. Grübel, E. Recknagel, H. Skudlik, Th. Wichert: Hyp. Int.35, 719 (1987)
G.J. Kemerink, F. Pleiter: Phys. Lett.121, 367 (1987)
D. Forkel, F. Meyer, W. Witthuhn, H. Wolf, M. Deicher, M. Uhrmacher: Hyp. Int.35, 715 (1987)
G.D. Watkins: Deep Centers in Semiconductors, ed. by S.T. Pantelides (Gordon and Breach, New York 1985) p. 147
J. Narayan, O.W. Holland, B.R. Appleton: J. Vac. Sci. Technol. B1, 871 (1983)
H.S. Rupprecht, A.E. Michel: Ion Implantation and Beam Processing, ed. by J.S. Williams, J.M. Poate (Academic, Sydney 1984) p. 311
W. Hayes, A.M. Stoneham:Defects and Defect Processes in Nonmetallic Solids (Wiley, New York, 1984)
P.J. Dean:Progress in Solid State Chemistry (Pergamon, New York) Vol. 8, 1 (1973)
J.W. Mayer, L. Eriksson, J.A. Davies:Ion Implantation in Semiconductors (Academic, New York 1970)
M.L. Swanson, N.R. Parikh, E.C. Frey, Th. Wichert: Nucl. Instr. Meth. B33, 591 (1988)
Th. Wichert, M.L. Swanson, A.T. Quenneville: Phys. Rev. Lett.57, 1757 (1986)
M.L. Swanson, Th. Wichert, A.T. Quenneville: Appl. Phys. Lett.49, 265 (1986)
Th. Wichert, M.L. Swanson: To be published
L. Pauling:Die Natur der chemischen Bindung (Verlag Chemie, Weinheim 1973)
D. Forkel, H. Foettinger, M. Iwatschenko-Borho, S. Malzer, F. Meyer, W. Witthuhn, H. Wolf: Proc. 14th Intl. Conf. Defects in Semiconductors, ed. by H.J. von Bardeleben (Trans Tech Publications, Switzerland 1986) p. 557
D. Forkel, W. Witthuhn: Private communication
A. Erbil, G.S. Cargill III, R.F. Boehme: Mat. Res. Soc. Symp. Proc.41, 275 (1985)
R.B. Fair, G.R. Weber: J. Appl. Phys.44, 273 (1973)
A. Kamgar, F.A. Baiocchi: Mat. Res. Soc. Symp. Proc.52, 23 (1986) and other contributions to this volume
Th. Wichert, M.L. Swanson, A.T. Quenneville: Proc. 14th Intl. Conf. Defects in Semiconductors, ed. by H.J. von Bardeleben (Trans Tech Publications, Switzerland 1986) p. 551
G.D. Watkins, F.S. Ham: Phys. Rev. B10, 4071 (1970)
M. Cardona, S.C. Shen, S.P. Varma: Phys. Rev. B23, 5329 (1981)
C.-T. Sah, J.Y.-C. Sun, J.J.-T. Tzou: Appl. Phys. Lett.43, 204 (1983)
J.I. Pankove, D.E. Carlson, J.E. Berkeyheiser, R.O. Wance: Phys. Rev. Lett.51, 2224 (1983)
M. Stavola, S.J. Pearton, G. Davies: Mat. Res. Soc. Symp. Proc. Vol. 104 (1988)
S.J. Pearton, J.W. Corbett, T.S. Shi: Appl. Phys. A43, 153 (1987)
A. Schnegg, M. Grundner, H. Jacob: Semiconductor Silicon, Proc. 86-4, ed. by H.R. Huff, T. Abe, B. Kolbesen (The Electrochemical Soc., Pennington 1986) p. 198
A. Schnegg, H. Prigge, M. Grundner, P.O. Hahn, H. Jacob: Mat. Res. Soc. Symp. Proc.104, 291 (1988)
C.H. Seager, R.A. Anderson, J.K.G. Panitz: J. Mater. Res.2, 96 (1987)
Th. Wichert, H. Skudlik, M. Deicher, G. Grübel, R. Keller, E. Recknagel, L. Song: Phys. Rev. Lett.59, 2087 (1987)
A.D. Marwick, G.S. Oehrlein, N.M. Johnson: Phys. Rev. B36, 4539 (1987)
A.D. Marwick, G.S. Oehrlein, J.H. Barrett, N.M. Johnson: Mat. Soc. Symp. Proc.104, 259 (1988)
B. Bech Meisen, J.U. Andersen, S.J. Pearton: Phys. Rev. Lett.60, 321 (1988)
Th. Wiehert, H. Skudlik, H.-D. Carstanjen, T. Enders, M. Deicher, G. Grübel, R. Keller, L. Song, M. Stutzmann: Mat. Res. Soc. Symp. Proc.104, 265 (1988)
N.M. Johnson, F.A. Ponce, R.A. Street, R.J. Nemanich: Phys. Rev. B35, 4166 (1987)
C.-T. Sah, S.C.-S. Pan, C.C.-H. Hsu: J. Appl. Phys.57, 5148 (1985)
J. Reichel, S. Sevcik: Phys. Stat. Sol. (a)103, 413 (1987)
C.E. Jones, G.E. Johnson: J. Appl. Phys.52, 5159 (1981)
R. Baron, J.P. Baukus, S.D. Allen, T.C. McGill, M.H. Young, H. Kimura, H.V. Winston, O.J. Marsh: Appl. Phys. Lett.34, 257 (1979)
A. Schnegg, H. Prigge: Private communication
D. Forkel et al: Submitted
J.C. Soares, G. Grübel, C. Jeynes, B.L. Sealy, M.F. da Silva, A.A. Melo: Europ. Mat. Res. Soc. Symp. Proc.15, 595 (1987)
R. Kalish, M. Deicher, G. Schatz: J. Appl. Phys.53, 4793 (1982)
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Wichert, T., Deicher, M., Grübel, G. et al. Indium-defect complexes in silicon studied by perturbed angular correlation spectroscopy. Appl. Phys. A 48, 59–85 (1989). https://doi.org/10.1007/BF00617764
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DOI: https://doi.org/10.1007/BF00617764