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Ion Beams in Nanoscience and Technology

  • Book
  • © 2010

Overview

Editors:
  1. Ragnar Hellborg

    1. Inst. Technology, University of Lund, Lund, Sweden

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  2. Harry J. Whitlow

    1. Dept. Physics, University of Jyväskylä, Jyväskylä, Finland

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    You can also search for this editor in PubMed   Google Scholar

  3. Yanwen Zhang

    1. Pacific Northwest National Laboratory, Richland, U.S.A.

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Part of the book series: Particle Acceleration and Detection (PARTICLE)

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About this book

Energetic ion beam irradiation is the basis of a wide plethora of powerful research- and fabrication-techniques for materials characterisation and processing on a nanometre scale. Materials with tailored optical, magnetic and electrical properties can be fabricated by synthesis of nanocrystals by ion implantation, focused ion beams can be used to machine away and deposit material on a scale of nanometres and the scattering of energetic ions is a unique and quantitative tool for process development in high speed electronics and 3-D nanostructures with extreme aspect radios for tissue engineering and nano-fluidics lab-on-a-chip may be machined using proton beams. This book will benefit practitioners, researchers and graduate students working in the field of ion beams and application and more generally everyone concerned with the broad field of nanoscience and technology.

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Table of contents (34 chapters)

  1. Front Matter

    Pages i-xx
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  2. Trends in Nanoscience and Technology

    1. Front Matter

      Pages 1-1
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  3. Trends in nanoscience and technology

    1. Nanoscale Engineering in the Biosciences

      • Daniel J. White, Harry J. Whitlow
      Pages 3-20

    2. High Speed Electronics

      • Mikael Östling, B. Gunnar Malm
      Pages 21-35

    3. Surface Modification Using Reactive Landing of Mass-Selected Ions

      • Peng Wang, Julia Laskin
      Pages 37-65

  4. Basic Ion-Matter Interactions in Nanometre Scale Materials

    1. Front Matter

      Pages 67-67
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  5. Basic ion-matter interactions in nanometre scale materials

    1. Basics of Ion Scattering in Nanoscale Materials

      • Harry J. Whitlow, Yanwen Zhang
      Pages 69-86

    2. Box 1: Stopping of Ions in Nanomaterials

      • Yanwen Zhang, William J. Weber
      Pages 87-93

    3. Box 2: Sputtering

      • Hans Henrik Andersen
      Pages 95-101

    4. Box 3: Ion Ranges

      • Yanwen Zhang
      Pages 103-105

    5. Computer Simulation Methods for Defect Configurations and Nanoscale Structures

      • Fei Gao
      Pages 107-127

    6. Characterising Nanoscale Crystal Perfection by Crystal Mapping

      • Sachiko T. Nakagawa
      Pages 129-145

    7. Box 4: Interatomic Potential

      • Fei Gao
      Pages 147-149

  6. Ion Beam Characterisation of Nanoscale Materials

    1. Front Matter

      Pages 151-151
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  7. Ion beam characterisation of nanoscale materials

    1. Medium Energy Ion Scattering for Near Surface Structure and Depth Profiling

      • Torgny Gustafsson
      Pages 153-167

    2. Box 5: Surface Crystallography Terminology

      • Harry J. Whitlow, Sachiko T. Nakagawa
      Pages 169-170

    3. Thin Film Characterisation Using MeV Ion Beams

      • Timo Sajavaara, Kai Arstila
      Pages 171-183

    4. Nanoscale Materials Defect Characterisation

      • Eduardo Alves, Mark Breese
      Pages 185-204

    5. Box 6: Nanoscale Defects

      • Eduardo Alves, Mark Breese
      Pages 205-210

    6. Box 7: Diagnostic Ion Beam Luminescence

      • Peter Townsend
      Pages 211-217
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Editors and Affiliations

  • Inst. Technology, University of Lund, Lund, Sweden

    Ragnar Hellborg

  • Dept. Physics, University of Jyväskylä, Jyväskylä, Finland

    Harry J. Whitlow

  • Pacific Northwest National Laboratory, Richland, U.S.A.

    Yanwen Zhang

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