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References
General References
Voelkl E, Allard LF, Joy DC (eds) (1999) Introduction to Electron Holography. Springer Science+Business Media New York
Tonomura A (2010) Electron Holography. Series in Optical Sciences. Springer, Berlin Heidelberg
Lichte H, Lehmann M (2008) Electron holography – basics and applications. Annu Rev Modern Phys 71:016102
Lehmann M, Lichte H (2002) Tutorial on Off-axis Electron Holography. Microsc Microanal 8:447–466
Historic Papers
Gabor D (1948) A New Microscopic Principle. Nature 161:563–564
Gabor D (1949) Microscopy by reconstructed wave fronts. Proc R Soc. A197:454–487
Möllenstedt G, Düker H (1956) Beobachtungen und Messungen an Biprisma-Interferenzen mit Elektronenwellen. Z Phys 145:377
Leith EH, Upatnieks J (1962) Reconstructed wave fronts and communication theory. J Opt Soc Am 52:1123–1130
Möllenstedt G, Wahl H (1968) Elektronenholographie und Rekonstruktion mit Laserlicht. Naturwissenschaften 55:340–341
Tonomura A, Fukuhara A, Watanabe H, Komoda T (1968) Optical Reconstruction of Image from Fraunhofer Electron-hologram. Jpn J Appl Phys 7:295
Wahl H (1975). Bildebenenholographie mit Elektronen. Thesis, University of Tübingen.
Possibilities and Limits of Hardware Aberration Correction
Ji CL, Houben L, Thust A, Barthel J (2010) On the benefit of the negative spherical-aberration imaging technique for quantitative HRTEM. Ultramicroscopy 110:500
Rose H (2010) Theoretical aspects of image formation in the aberration-corrected electron microscope. Ultramicroscopy 110:488
Uhlemann S, Müller H, Hartel P, Zach J, Haider M (2013) Thermal Magnetic Field Noise Limits Resolution in Transmission Electron Microscopy. Phys Rev Lett 111:046101
Barthel J, Thust A (2013) On the optical stability of high-resolution transmission electron microscopes. Ultramicroscopy 134:6–17
Performance and Limits of Holography
Harscher A, Lichte H (1996) Experimental study of amplitude and phase detection limits in electron holography. Ultramicroscopy 64:57–66
Lichte H (2008) Performance limits of electron holography. Ultramicroscopy 108:256
Voelkl E, Tang D (2010) Approaching routine 2Ï€/1000 phase resolution for off-axis type holography. Ultramicroscopy 110:447
Niermann T, Lehmann M (2013) Averaging scheme for atomic resolution off-axis electron holograms. Micron 63:28–34
Advanced Holographic Setup
Lichte H (1996) Electron holography: Optimum position of the biprism in the electron microscope. Ultramicroscopy 64:79–86
Harada K, Tonomura A, Togawa Y, Akashi T, Matsuda T (2004) Double-biprism electron interferometry. Appl Phys Lett 84:3229
Tanigaki T, Aizawa S, Park HS, Matsuda T, Harada K, Shindo D (2014) Advanced split-illumination electron holography without Fresnel fringes. Ultramicroscopy 137:7–11
Atomic Resolution Electron Holography
Lichte H (1986) Electron holography approaching atomic resolution. Ultramicroscopy 20(3):293–304
Linck M, Freitag B, Kujawa S, Lehmann M, Niermann T (2012) State of the art in atomic resolution off-axis electron holography. Ultramicroscopy 116:13–23
Linck M (2013) Optimum aberration coefficients for recording high-resolution off-axis holograms in a Cs-corrected TEM. Ultramicroscopy 124:77–87
Lubk RFA, Lichte H, Bredow T, Yu W, Mader W (2010) Long-range correlations in In2O3 (ZnO)7 investigated by DFT calculations and electron holography. Ultramicroscopy 110:400
Imaging and Measurements of Electric Potentials
Frabboni S, Matteucci G, Pozzi G, Vanzi M (1985) Electron Holographic Observations of the Electrostatic Field Associated with Thin Reverse-Biased p–n Junctions. Phys Rev Lett 55:2196
McCartney MR, Smith DJ, Hull R, Bean JC, Voelkl E, Frost B (1994) Direct observation of potential distribution across Si/Si pn junctions using off-axis electron holography. Appl Phys Lett 65:2603
Rau WD, Schwander P, Baumann FH, Höppner W, Ourmazd A (1999) Two-Dimensional Mapping of the Electrostatic Potential in Transistors by Electron Holography. Phys Rev Lett 82:2614–2617
Twitchett AC, Dunin-Borkowski RE, Midgley PA (2002) Quantitative Electron Holography of Biased Semiconductor Devices. Phys Rev Lett 88:238302
Cooper D, Ailliot C, Barnes JP, Hartmann JM, Salles P, Benassayag G, Dunin-Borkowski RE (2010) Dopant profiling of focused ion beam milled semiconductors using off-axis electron holography; reducing artifacts, extending detection limits and reducing the effect of gallium implantation. Ultramicroscopy 110:383
Kruse P, Schowalter M, Lamoen D, Rosenauer A, Gerthsen D (2006) Determination of the mean inner potential in III–V semiconductors, Si and Ge by density functional theory and electron holography. Ultramicroscopy 106:105
Ponce FA (2011) Electrostatic energy profiles at nanometer-scale in group III nitride semiconductors using electron holography. Ann Phys, Berlin 52:75–86
Zhou L, Gonschorek M, Giraud E, Feltin E, Carlin JF, Grandjean N, Smith DJ, McCartney MR (2012) Measurement of polarization-induced electric fields in GaN/AlInN quantum wells. Appl Phys Lett 101:251902
Simon P, Huhle R, Lehmann M, Lichte H, Mönter D, Bieber Th, Reschetilowski W, Adhikari R, Michler GH (2002) Electron holography on beam sensitive materials: organic polymers and mesoporous silica. Chem Mater 14:1505–1514
Tanji T, Urata K, Ishizuka K, Ru Q, Tonomura A (1993) Observation of atomic surface potential by electron holography. Ultramicroscopy 49:259–264
Wanner M, Bach D, Gerthsen D, Werner R, Tesche B (2006) Electron holography of thin amorphous carbon films: measurement of the mean inner potential and a thickness-independent phase shift. Ultramicroscopy 106:341
Electron Holographic Tomography and Dark-Field Electron Holography
Twitchett-Harrison AC, Yates TJV, Dunin-Borkowski RE, Midgley PA (2008) Quantitative electron holographic tomography for the 3D characterisation of semiconductor device structures. Ultramicroscopy 108:1401–1407
Wolf D, Lubk A, Röder F, Lichte H (2013) Electron holographic tomography. Current Opinion Solid State Mater Sci 17:126–134
Hÿtch MJ, Houdellier F, Hüe F, Snoeck E (2008) Nanoscale holographic interferometry for strain measurements in electronic devices. Nature 453:1086
Hÿtch MJ, Houdellier F, Hüe F, Snoeck E (2011) Dark-field electron holography for the measurement of geometric phase. Ultramicroscopy 111:1328–1337
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Appendix
Appendix
8.1.1 People
Dennis Gábor, born June 5, 1900 in Budapest, died February 8, 1979 in London; inventor of holography, 1947; received Nobel Prize, 1971.
Gottfried Möllenstedt , born September 14, 1912 in Versmold, died September 11, 1997 in Tübingen; fundamental experiments on electron interferometry; inventor of the Möllenstedt biprism (together with Heinrich Düker in 1954), initially using a metal-coated spider’s web.
Akira Tonomura, born April 25, 1942, died May 2, 2012; known for his work on electron holography and in particular for the experimental verification of the Aharonov–Bohm effect. His family moved away from Hiroshima two months before August 1945. He worked in Tübingen 1973–4.
8.1.2 Self-Assessment Questions
- Q9.1:
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Why should you consider using electron holography in an image C s-corrected TEM for atomic imaging?
- Q9.2:
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Why it is not possible to image the potential distribution of a p–n junction in a fully image C s-corrected TEM?
- Q9.3:
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Why it is so important to image the phase of the object exit-wave? How this is done at least partially in conventional TEM?
- Q9.4:
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What is the difference between a diffractogram and a diffraction pattern?
- Q9.5:
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Name the contributions to shifting the phase of an electron wave.
- Q9.6:
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Why is there a difference between an object exit-wave and an image wave?
- Q9.7:
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What are experimental prerequisites for imaging electric potentials on the mesoscopic scale?
- Q9.8:
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Why does electron holography use an elliptically shaped illumination ?
- Q9.9:
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Why it is so important to first maximize the interference fringe contrast and only second the number of registered electrons?
- Q9.10:
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What are the possible applications of electron holography in material sciences?
- Q9.11:
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What is the difference between the phase of the electron wave and the geometric phase?
- Q9.12:
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What are the reasons that reconstructions from electron holograms are not 3D?
- Q9.13:
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What is the difference between strain and displacement field?
8.1.3 Text-Specific Questions
- T9.1:
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Calculate the imaging of an object exit-wave into the image wave and its recording as intensity on the detector within the weak object approximation.
- T9.2:
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Perform the tricky integration to show that the phase shift of the electron wave is caused by the projected potential and the enclosed magnetic flux .
- T9.3:
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Look up the mathematical formulation of the wave aberration χ. Which aberrations are included and which are not? Why?
- T9.4:
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Show that two coherent inclined waves brought to an overlap produce a cosinusoidal interference pattern on the detector.
- T9.5:
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Show by calculation that distortion-induced phase modulations can indeed be corrected by an empty hologram.
- T9.6:
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How are aberrations corrected numerically?
- T9.7:
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What are dead layers in the context of imaging p–n junctions, and why is this model too simple?
- T9.8:
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Make a sketch of the ray paths for dark-field electron holography.
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Lehmann, M., Lichte, H. (2016). Electron Holography. In: Carter, C., Williams, D. (eds) Transmission Electron Microscopy. Springer, Cham. https://doi.org/10.1007/978-3-319-26651-0_8
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