Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
Suntola T, Antson J (1976) Apparatus and method for growing thin compound films. 75-2553048, 2553048, 19751126
Gregory BW, Norton ML, Stickney JL (1990) Thin-layer electrochemical studies of the underpotential deposition of cadmium and tellurium on polycrystalline Au, Pt and Cu electrodes. J Electroanal Chem 293(1–2):85–101
Gregory BW, Stickney JL (1991) Electrochemical atomic layer epitaxy (ECALE). J Electroanal Chem 300(1–2):543–561
Kolb DM (1978) Physical and electrochemcial properties of metal monolayers on metallic substrates. In: Gerischer H, Tobias CW (eds) Advances in electrochemistry and electrochemical engineering, vol 11. Wiley, New York, p 125
Stickney JL, Rosasco SD, Song D, Soriaga MP, Hubbard AT (1983) Superlattices formed by electrodeposition of silver on iodine-pretreated Pt(111); studies by LEED, Auger spectroscopy and electrochemistry. Surf Sci 130(2):326–347
Gu CK, Xu H, Park M, Shannon C (2009) Synthesis of metal-semiconductor core-shell nanoparticles using electrochemical surface-limited reactions. Langmuir 25(1):410–414
Foresti ML, Pezzatini G, Cavallini M, Aloisi G, Innocenti M, Guidelli R (1998) Electrochemical atomic layer epitaxy deposition of CdS on Ag(111): an electrochemical and STM investigation. J Phys Chem B 102(38):7413–7420
Colletti LP, Teklay D, Stickney JL (1994) Thin-layer electrochemical studies of the oxidative underpotential depostiion of sulfur and its application to the electrochemical atomic layer eptiaxy deposition of CdS. J Electroanal Chem 369(1–2):145–152
Liang X, Zhang Q, Lay MD, Stickney JL (2011) Growth of Ge nanofilms using electrochemical atomic layer deposition, with a “Bait and Switch” Surface-limited reaction. J Am Chem Soc 133(21):8199–8204
Brankovic SR, Wang JX, Adzic RR (2001) Metal monolayer deposition by replacement of metal adlayers on electrode surfaces. Surf Sci 474(1–3):L173–L179
Mrozek MF, Xie Y, Weaver MJ (2001) Surface-enhanced Raman scattering on uniform platinum-group overlayers: preparation by redox replacement of underpotential-deposited metals on gold. Anal Chem 73(24):5953–5960
Kim Y-G, Kim JY, Vairavapandian D, Stickney JL (2006) Platinum nanofilm formation by EC-ALE via redox replacement of UPD copper: studies using in-situ scanning tunneling microscopy. J Phys Chem B 110(36):17998–18006
Vasilic R, Dimitrov N (2005) Epitaxial growth by monolayer-restricted galvanic displacement. Electrochem Solid-State Lett 8(11):C173–C176
Pezzatini G, Caporali S, Innocenti M, Foresti ML (1999) Formation of ZnSe on Ag(111) by electrochemical atomic layer epitaxy. J Electroanal Chem 475(2):164–170
Demir U, Shannon C (1994) A scanning tunneling microscopy study of electrochemically grown cadmium sulfide monolayers on Au(111). Langmuir 10(8):2794–9
Streltsov ES, Labarevich II, Talapin DV (1994) Electrochemical formation of monolayer films of cadmium-sulfide on the Au surface. Dokl Akad Nauk Bel 38(5):64
Wade TL, Ward LC, Maddox CB, Happek U, Stickney JL (1999) Electrodeposition of InAs. Electrochem Sol State Lett 2(12):616–618
Innocenti M, Forni F, Pezzatini G, Raiteri R, Loglio F, Foresti ML (2001) Electrochemical behavior of As on silver single crystals and experimental conditions for InAs growth by ECALE. J Electroanal Chem 514(1–2):75–82
Wade TL, Vaidyanathan R, Happek U, Stickney JL (2001) Electrochemical formation of a III-V compound semiconductor superlattice: InAs/InSb. J Electroanal Chem 500(1–2):322–332
Venkatasamy V, Jayaraju N, Cox SM, Thambidurai C, Stickney JL (2007) Studies of Hg(1-x)CdxTe formation by electrochemical atomic layer deposition and investigations into bandgap engineering. J Electrochem Soc 154(8):H720–H725
Torimoto T, Takabayashi S, Mori H, Kuwabata S (2002) Photoelectrochemical activities of ultrathin lead sulfide films prepared by electrochemical atomic layer epitaxy. J Electroanal Chem 522(1):33–39
Oeznuelueer T, Erdogan I, Sisman I, Demir U (2005) Electrochemical atom-by-atom growth of PbS by modified ECALE method. Chem Mater 17(5):935–937
Vaidyanathan R, Stickney JL, Happek U (2004) Quantum confinement in PbSe thin films electrodeposited by electrochemical atomic layer epitaxy (EC-ALE). Electrochim Acta 49(8):1321–1326
Banga D, Stickney JL (2007) PbTe – PbSe superlattice formation by electrochemical atomic layer deposition. ECS Trans 6 (2, State-of-the-Art Program on Compound Semiconductors 46 (SOTAPOCS 46) and Processes at the Semiconductor/Solution Interface 2): 439–449
Vaidyanathan R, Cox SM, Happek U, Banga D, Mathe MK, Stickney JL (2006) Preliminary studies in the electrodeposition of PbSe/PbTe superlattice thin films via electrochemical atomic layer deposition (ALD). Langmuir 22(25):10590–10595
Zhu W, Yang JY, Zhou DX, Xiao CJ, Duan XK (2008) Development of growth cycle for antimony telluride film on Au(111) disk by electrochemical atomic layer epitaxy. Electrochim Acta 53(10):3579–3586
Zhu W, Yang JY, Gao XH, Bao SQ, Fan XA, Zhang TJ, Cui K (2005) Effect of potential on bismuth telluride thin film growth by electrochemical atomic layer epitaxy. Electrochim Acta 50(20):4041–4047
Liang X, Jayaraju N, Thambidurai C, Zhang Q, Stickney JL (2011) Controlled electrochemical formation of GexSbyTez using Atomic Layer Deposition (ALD). Chem Mater 23(7):1742–1752
Huang BM, Colletti LP, Gregory BW, Anderson JL, Stickney JL (1995) Preliminary studies of the use of an automated flow-cell electrodeposition system for the formation of CdTe thin-films by electrochemical atomic layer epitaxy. J Electrochem Soc 142(9):3007–3016
Liang X, Kim Y-G, Gebergziabiher DK, Stickney JL (2010) Aqueous electrodeposition of Ge monolayers. Langmuir 26(4):2877–2884
Banga D, Jarayaju N, Sheridan L, Kim Y-G, Perdue B, Zhang X, Zhang Q, Stickney J (2012) Electrodeposition of CuInSe2 (CIS) via Electrochemical Atomic Layer Deposition (E-ALD). Langmuir 28(5):3024–3031
Dimitrov N, Vasilic R, Vasiljevic N (2007) A kinetic model for redox replacement of UPD layers. Electrochem Solid State Lett 10(7):D79–D83
Kim JY, Kim YG, Stickney JL (2008) Cu nanofilm formation by electrochemical atomic layer deposition (ALD) in the presence of chloride ions. J Electroanal Chem 621(2):205–213
Viyannalage LT, Vasilic R, Dimitrov N (2007) Epitaxial growth of Cu on Au(111) and Ag(111) by surface limited redox replacement-An electrochemical and STM study. J Phys Chem C 111(10):4036–4041
Thambidurai C, Kim Y-G, Stickney JL (2008) Electrodeposition of Ru by atomic layer deposition (ALD). Electrochim Acta 53(21):6157–6164
Zou S, Weaver MJ (1999) Surface-enhanced Raman spectroscopy of cadmium sulfide/cadmium selenide superlattices formed on gold by electrochemical atomic-layer epitaxy. Chem Phys Lett 312(2–4):101–107
Banga D, Kim Y-G, Stikney J (2011) PbSe/PbTe Superlattice Formation via Electrochemical Atomic Layer Depostion (E-ALD). J. Electrochem. Soc. 153:D99–D106.
Acknowledgment
Support of the National Science Foundation, Division of Materials Research, Award #1006747, is duly acknowledged.
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2014 Springer Science+Business Media New York
About this entry
Cite this entry
Stickney, J. (2014). Semiconductors, Electrochemical Atomic Layer Deposition (E-ALD). In: Kreysa, G., Ota, Ki., Savinell, R.F. (eds) Encyclopedia of Applied Electrochemistry. Springer, New York, NY. https://doi.org/10.1007/978-1-4419-6996-5_31
Download citation
DOI: https://doi.org/10.1007/978-1-4419-6996-5_31
Published:
Publisher Name: Springer, New York, NY
Print ISBN: 978-1-4419-6995-8
Online ISBN: 978-1-4419-6996-5
eBook Packages: Chemistry and Materials ScienceReference Module Physical and Materials ScienceReference Module Chemistry, Materials and Physics