Abstract
Nickel high energy X-ray compound kinoform lenses were fabricated by X-ray lithography technology at Beijing Synchrotron Radiation Facility. The nickel compound refractive lenses aim at focusing X-ray with 50 keV and the designed smallest width of the tooth-like segment is 2.5 μm. To keep the best morphology of the element, Au masks were made twice, whose thickness gradually increased. The fabrication process of compound lenses consists of three parts in general, including the intermediate mask (1.2 μm thick Au pattern) fabrication, the working mask (12 μm thick Au pattern) fabrication and the 300 μm high lenses fabrication. The intermediate mask was made by UV lithography (UV sample) and electron beam direct write lithography (EBDW sample) for comparison, and the EBDW sample had a better morphology than the UV sample at each step. Both samples were tested using the knife-edge scan method at BL13W1 beamline in Shanghai Synchrotron Radiation Facility, which provided the focal widths of 9.2 and 10.4 μm, and the photon flux gains of 6.9 and 5.4 for the EBDW and UV samples at an X-ray energy with 50 keV, respectively.
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References
Alianelli L, Sawhney KJS, Barrett R, Pape I, Malik A, Wilson MC (2011) High efficiency nano-focusing kinoform optics for synchrotron radiation. Opt Expr 19:11120–11127
Aristov V, Grigoriev M, Kuznetsov S, Shabelnikov L, Yunkin V, Weitkamp T, Rau C, Snigireva I, Snigirev A, Hoffmann M, Voges E (2000) X-ray refractive planar lens with minimized absorption. Appl Phys Lett 77:4058–4060
Evans-Lutterodt K, Ablett JM, Stein A, Kao CC, Tennant DM, Klemens F, Taylor A, Gammel PL, Huggins H, Ustin S, Bogart G, Ocola L (2003) Single-element elliptical hard x-ray micro-optics. Opt Expr 11:919–926
Evans-Lutterodt K, Stein A, Ablett JM, Bozovic N, Taylor A, Tennant DM (2007) Using compound kinoform hard-X-ray lenses to exceed the critical angle limit. Phys Rev Lett 99:134801
Hong X, Ehm L, Zhong Z, Ghose S, Duffy TS, Weidner DJ (2016) High-energy X-ray focusing and applications to pair distribution function investigation of Pt and Au nanoparticles at high pressures. Sci Rep 6:21434
Karvinen P, Grolimund D, Willimann M, Meyer B, Birri M, Borca C, Patommel J, Wellenreuther G, Falkenberg G, Guizar-Sicairos M, Menzel A, David C (2014) Kinoform diffractive lenses for efficient nanofocusing of hard X-rays. Opt Expr 22:16676–16685
Lengeler B, Schroer CG, Benner B, Gunzler TF, Kuhlmann M, Tummler J, Simionovici AS, Drakopoulos M, Snigirev A, Snigireva I (2001) Parabolic refractive X-ray lenses: a breakthrough in X-ray optics. Nucl Instrum Methods Phys Res Sect A-Accel Spectrom Dect Assoc Equip 467:944–950
Liao YX, Yi FT (2010) The fabrication and photoelectric properties of the nanopillar arrays for solar cell. Nanotechnology 21:465302
Liao KL, Liu J, Liang H, Wu XH, Zhang K, Yuan QX, Yi FT, Sheng WF (2016) Sub-500 nm hard x ray focusing by compound long kinoform lenses, applied optics. Appl Opt 55:38–41
LiRtge R, Adam D, Burkhardt F, Hoke F, Schacke H, Schmidt M, Wolf H, Schmidt A (1999) 40 keV shaped electron beam lithography for LIGA intermediate mask fabrication. Microelectron Eng 46:247–250
Liu J, Ashmkhan M, Wang B, Yi FT (2012) Fabrication and reflection properties of silicon nanopillars by cesium chloride self-assembly and dry etching. Appl Surf Sci 258:8825–8830
Nazmov V, Reznikova E, Snigirev A, Snigireva I, DiMichiel M, Grigoriev M, Mohr J, Matthis B, Saile V (2005) LIGA fabrication of X-ray nickel lenses. Microsyst Technol 11:292–297
Nazmov V, Kluge M, Last A, Marschall F, Mohr J, Simon HV (2014) LIGA micro-openings for coherence characterization of X-rays. Microsyst Technol 20:2031–2036
Nazmov V, Mohr J, Greving I, Ogurreck M, Wilde F (2015) Modified x-ray polymer refractive cross lens with adiabatic contraction and its realization. J Micromech Microeng 25:055010
Sandy AR, Narayanan S, Sprung M, Su JD, Evans-Lutterodt K, Isakovic AF, Stein A (2010) Kinoform optics applied to x-ray photoncorrelation spectroscopy. J Synchrotron Radiat 17:314–320
Scheunemann H, Loechel B, Jian L, Schondelmaier D, Desta YM, Goettert J (2003) Cost effective masks for deep X-ray lithography. Proc of SPIE 5116:775–781
Shabel’nikov L, Nazmov V, Pantenburg FJ, Mohr J, Saile V, Yunkin V, Kouznetsov S, Pindyurin V, Snigireva I, Snigirev A (2002) X-ray lens with kinoform refractive profile created by X-ray lithography. Proc SPIE 4783:176–184
Snigirev A, Kohn V, Snigireva I, Lengeler B (1996) A compound refractive lens for focusing high energy X-rays. Nature 384:49–51
Snigirev A, Snigireva I, Souvorov A, Lengeler B, Kohn V (1998) Focusing high-energy X-rays by compound refractive lenses. Appl Opt 37:653–662
Snigirev A, Snigireva I, Di Michiel M, Honkimaki V, Grigoriev M, Nazmov V, Reznikova E, Mohr J, Saile V (2004) Sub-micron focusing of high energy X-rays with Ni refractive lenses. Proc SPIE 5539:244–250
Suter RM, Hennessy D, Xiao C, Lienert U (2006) Forward modeling method for microstructure reconstruction using x-ray diffraction microscopy: single-crystal verification. Rev Sci Instrum 77:123905
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This work was supported by Projects 11305202, 11605226 supported by NSFC.
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Liu, J., Zhang, W., Chang, G. et al. Fabrication of high energy X-ray compound kinoform lenses using X-ray lithography. Microsyst Technol 23, 1553–1562 (2017). https://doi.org/10.1007/s00542-017-3304-1
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DOI: https://doi.org/10.1007/s00542-017-3304-1