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Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices

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Abstract

Photosensitive poly(MMA-co-GMA) for optical waveguide was synthesized, and the refractive index of the polymer film was tuned in the range of 1.481–1.588 at 1550 nm by mixing with bis-phenol-A epoxy resin. The film, which was made by spinning coated the poly(MMA-co-GMA) with photo initiator, had good UV light lithograph sensitivity, high glass transition temperature (T g : 153°C, after crosslinking) and good thermal stabilities (T d : up to 324°C, after crosslinking). The optical waveguides with very smooth top surface were fabricated from the resulting polymer by direct UV exposure and chemical development. For waveguides with cladding, the propagation losses of the channel waveguides were measured to be below 3 dB/cm at 1550 nm.

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Authors and Affiliations

  1. Modern Education Technical Department, Dalian Polytechnic University, 1# Qinggongyuan Road, Dalian, 116034, P.R. China

    Xu Fei

  2. School of Vocational Technology, Liaoning Shihua University, Fushun, 113001, P.R. China

    Yuan Shi & Yang Cao

  3. College of Traffic, Jilin University, Changchun, 130012, P.R. China

    Yang Cao

Authors
  1. Xu Fei
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  2. Yuan Shi
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  3. Yang Cao
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Correspondence to Xu Fei.

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Fei, X., Shi, Y. & Cao, Y. Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices. Appl. Phys. A 100, 409–414 (2010). https://doi.org/10.1007/s00339-010-5851-5

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  • DOI: https://doi.org/10.1007/s00339-010-5851-5

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